SCIENCE

FRANKLIN, MA –Extraction Systems today introduced the Extraction 3000, a next-generation hybrid filter system designed to safeguard optics and resists in 193nm lithography systems. The Extraction 3000 filter system specifically targets molecular acids, bases, and condensables - a new and broader range of contaminants threatening optical components and thinner, more sensitive resists in advanced lithography. "The Extraction 3000 answers the call for enhanced optics and resist protection," said Devon Kinkead, president and CEO of Extraction. "As we enter the 193nm lithography era, Extraction is leading the industry in understanding and controlling the molecular contaminants that lead to reduced optics lifetimes and, in some cases, the need to replace costly optical elements altogether." The Extraction 3000 is the first commercial product to emerge from the company's optics protection R&D group, which was established earlier this year specifically to address optics contamination issues. In the 100nm device generation, optics contamination joins resist protection as a top concern for semiconductor manufacturers. Although molecular contamination poses limited risks to 248nm lithography optics, 193nm exposure tools are highly susceptible to molecular condensables and acids commonly found in the chipmaking environment. These molecular contaminants react with the high-energy photons of 193nm wavelength light and form damaging films on the optical elements in exposure tools. "By the time these molecular ghosts show themselves, the damage has already been done in terms of transmission loss, illumination nonuniformity, and light scattering - all leading to lost productivity and image quality," Kinkead added. "The Extraction 3000 gives our customers the ability to capture the contaminants before they can even begin to degrade optics performance." The Extraction 3000 couples proven contamination-control solutions for resists with the advanced ability to capture molecular acids, bases, and condensables. The system's hybrid filter technology has nearly nine times more capacity per unit size and weight to capture these contaminants than conventional filtration systems. Designed for maximum flexibility, the Extraction 3000 incorporates several in-series filters that can be optimized for specific filtration needs. This in-series capability also allows operators to improve filter lifetimes and optimize cost-of-ownership. The Extraction 3000's configuration and flexibility allow quick and easy installation for the end user. The serial flow design allows Extraction to provide filters with exceptional and predictable lifetime and efficiency. The design enables continuous measurement of filter condition and service life during operation, providing uninterrupted protection from the new 193nm-mandated range of pollutants. The product began shipping in June of 2001. For more information visit www.extractionsystemsinc.com